Articles | Volume 12, issue 1
https://doi.org/10.5194/ms-12-133-2021
https://doi.org/10.5194/ms-12-133-2021
Research article
 | 
11 Feb 2021
Research article |  | 11 Feb 2021

Research on a UV-assisted chemical modification strategy for monocrystalline silicon

Yinghui Ren, Kexin Li, Wei Li, Xu Han, and Xiaoman Liu

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Subject: Machining and Manufacturing Processes | Techniques and Approaches: Experiment and Best Practice
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Cited articles

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Ishimarua, D., Tougea, M., Mutaa, H., Kubotaa, A., Sakamoto, T., and Sakamoto, S.: Burr Suppression Using Sharpened Pcd Cutting Edge by Ultraviolet-Ray Irradiation Assisted Polishing, Procedia CIRP, 1, 184–189, https://doi.org/10.1016/j.procir.2012.04.032, 2012. 
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Short summary
In order to improve modification effectiveness, a novel UV-assisted chemical modification (UVA-CM) strategy is proposed based on UV photocatalytic theory, which contributes to developing a novel hybrid chemo-mechanical process monocrystalline silicon. A series of comparative experiments was performed to evaluate modification effectiveness among different strategies. The results show that the liquid–solid chemical modification effect is obviously enhanced through UV advanced oxidation reactions.