Analysis of the influence of magnetic field on polishing results in reciprocating magnetorheological polishing

Wang, Rensheng; Liang, Dongming; Kong, Xiangna; Wang, Qi

doi:10.5194/ms-17-873-2026

Articles | Volume 17, issue 2

https://doi.org/10.5194/ms-17-873-2026

© Author(s) 2026. This work is distributed under
the Creative Commons Attribution 4.0 License.

https://doi.org/10.5194/ms-17-873-2026

© Author(s) 2026. This work is distributed under
the Creative Commons Attribution 4.0 License.

Articles | Volume 17, issue 2

Research article

|

22 Sep 2026

Research article |

| 22 Sep 2026

Analysis of the influence of magnetic field on polishing results in reciprocating magnetorheological polishing

Rensheng Wang, Dongming Liang, Xiangna Kong, and Qi Wang

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Short summary

This study develops a magnetic field device for reciprocating magnetorheological polishing, examining how excitation current and working gap impact magnetic field performance and polishing effects via simulations and experiments. Magnetic induction intensity varies with these parameters, and optimal settings reduce specimen roughness to 41–42 nm from an initial value of approximately 325 nm.